Korean Chem. Eng. Res., Vol. 43, No. 1, February, 2005, pp. 129-135 Ks WÇÓ @` óslã Z / / k ãò H/ dhàhê 200-701 ãò [wq ÁÉ2Ÿ 192-1 (2004 6ö 8³ [, 2004 10ö 18³ >) Efficient Desulfurization and Denitrification by Low Temperature Plasma Process Sung-Min Kim, Dong-Joo Kim and Kyo-Seon Kim Department of Chemical Engineering, Kangwon National University, 192-1, Hyoza-2-dong, Chunchon, Kangwon-do 200-701, Korea (Received 8 June 2004; accepted 18 October 2004) ß á õcñš2 :) U³ öm à_ñ g SO 2 Q SO 2 /NO fmáss ~ Gk, ñ6 à_ Í fmá SÑ Ùj2 s ªJk³ ÆGŒ. à_ ³Š ÍMF, :)?², ÍQÑ, ä í ð, (NO, SO 2, NH 3, H 2 O and O 2 ) s ~ GŒ. Íæ2 MF, :)?² 2 ÍQÑ«ÍWÑ 2 O 2 Q H 2 OÍ ƒíöñ SO 2 fmásê SO 2 /NO ŸQ fmáso ÍGŒ. K, NH 3 ð, Í Í O SO 2 /NO fmáso ÍGŒ. «Y J êëo NO x Q SO x õ fmg,.k :) U³ öm à_ ßj ª,ð É0³ Äî ÀŒ. È Abstract In this study, we have analyzed the removal efficiencies of SO 2 and SO 2 /NO by the pulsed corona discharge process and investigated the effects of several process variables on those removal efficiencies systematically. The effects of process variables such as applied voltage, pulse frequency, residence time, and initial concentrations of reactants (NO, SO 2, NH 3, H 2 O, and O 2 ) on the removal efficiency were analyzed. As the applied voltage, the pulse frequency or the residence time increases or as the O 2 or the H 2 O or the NH 3 concentration in the inlet feed gas stream increases, the SO 2 removal efficiencies and the simultaneous removal efficiencies of SO 2 /NO also increase. These experimental results can be used as a basis to design the pulsed corona discharge process to remove NO x and SO x. Key words: Desulfurization, Denitrification, Low Temperatune Plasma Process, Removal Efficiency 1. C «M Ž,hs y[k³ h äfí j ãdæš h Æ«21 D M ÊzÍÍj Æk³ 1íÊ ÀŒ. U¾ h Æ o Œñ Æ~tQ õî «h ÆÑŠ ÿt«ª f0šñ )[J s k _ Í æéœ. ³ öm à_ Ñ K %z %0 D o Eo õg íèdññ ggê SO x, NO x ço D1 í0s ŸQÑ s-o À2 ßY ŽÑ DÊ ñ6 ör D J, fj, h 1 éfys ÝUg k À 2 D ³ ÍæÊ ÀŒ. D y æ2 1òs k«d.g Š2 ßDJ óòñš 1í fmßj íè Ú jí gæ 2) MÑ2 :) ³ öm à_s «ÄgŠ D 1ís fmgd.k õgí lè¾,}æê ÀŒ. I5 ñ K %z %0 àro DF ÆQÑŠ ñ K öm To whom correspondence should be addressed. E-mail: kkyoseon@kangwon.ac.kr s ³kE õí)ñ Wê 4zÍ) Ú 0dís fmg2 D «M Ë ª ÎhÑŠ äfg2 Í) ÜÍÍ SO 2 õ WÇGñ NO x, VOC(volatile organic compound), CO 2 Ùk³ e öñ! G Q)ÊÑŠ «Ë KgÍ)õ ŸQÑ s-o À2 á D y «4(Ê ÀŒ[1-5]. «D c U8 s Ý, ä Dõ DÊ MD4,DQ Ÿ³K Ž- gæõ ÄO À ðd ÉWÄ«kÎ IƒK ßYs äê Às O 4n ä D gæ kî Ñ GŒ. K, 8_K ³ Í ä D o òñ U æ, «âñ Ñw( HÍ JÊ ~,fmñ ÁêJ«Œ. U¾, äh ßjÍ ÍDG ³ c³ õ Í) s-d ³ íè«lè¾ «P (Ê ÀŒ[6-13]. Amirov Ù[14]o )T-Ë ³ ä D ÑŠ NO SO 2 f MÑ Ë s «J/Y Jk³ õgg2) OH, O 3, N Ù Ë«NO SO 2 fmñ s Âj2 ak³ ÝÊG Œ. Park Ù[15]o ³ öm Q)Ês «ÄK NO x fmñš SO 2 s õggk SO 2 Í CO 2 Q 竃íöñ! NO x 129
130 6 Æö6Ÿ?ö6/Ž fmás«íws îûgœ. Kimê Hong[16]o KM ßž ³ öms 0K NO x Q SO x ~gõ Y Gk, KM ßž, ä W gæ, õ s- ÆQ dõ 0g NO x Q SO x Í ~gæê fmás«íws ÝÊGŒ. DinelliQ Civitano[17]2 :) ³ ÑŠ õ á Í)³z NO x Q SO x ŸQ fmõ õgg k NO x Q SO x ðd, NH 3, ä D Í) 5, Hydrated lime Ù«NO x Q SO x fmásñ s c2 ak³ ÝÊGŒ. Kim Ù[18, 19]o :) ³ öm à_s «ÄK NO x fmñš ñ K dh Ú ½É ßs H1Rs ÄGñ õg GÊ ŸtHJ ½É U s ~ GŒ. (b( :) ³ öms «ÄK SO x Ú NO x fm õg2 Q«}æÉk ŸQ fmõ ÊsK ao í à_ d Í fmásñ Âj2 s ªJk³ ~ K õg2 4) ~ j :o =«Œ. á õgñš2 :) ³ öm ä Dõ «Ä K %z %0Q à_ dñ!ñ %z %0 U ê ŸQ fm õ ªJ Y s 0g ~ GŒ. 2. / á õgñš :) ³ öm ä Dõ «ÄK %z %0 õg õ.gš ÄK Y ßj í 2 Fig. 1ê çœ. Y ßj2 ä í c½ Ú f z, ä D, Mtà Ú f z -Ê Í ) +_z³ «P ÀŒ. NO, SO 2, NH 3, N 2 Ù D 2 ÎÎ MFCõ «ÄGñ _ àgœ. NO Ú SO 2 fm Y Q H 2 O s ÊsGD.g ³_ H 2 Oõ bubblerõ ÄGñ O 2 D Ñ dqe ä D ³ àgœ. O 2 D Ñ dê H 2 O Í ä D ³ àæd MÑ ŽG2 as ö(gd.g ùž s ÄGñ D 5 õ ³_Gj K(QZŒ. ä D³ àæ2 NH 3 Í ä D ³ àæd MÑ Œñ D Ëê ä G2 as ö (GD.gŠ NH 3 àžs Œñ D àžê ~-GŒ. NO Ú SO 2 fmõ.g á õgñš ÄK :) ³ öm ä D2 cylinder-wirek³š Y1 o 5cm«Ê L«2 38 cm«ä D é0o Pyrex«Œ. ³ è@ Mo ä D yññ jê )º -) Ž() 0.5 mm)«, [(o ä D žñ )º -) ak³ jgœ. [(Mo ò0k³ L «2 30 cm«œ[20]. ä DÑ ³ õ è@qÿd.g ÊMF è@d(kh Switching)õ ÄGŒ. Y ÑŠ ³ è@ MÑ àæ2 MF DQ c² 2 1Y³) é(tektronix TDS 220)õ Ä Gñ +_GŒ. ³ öm á NO x Ú SO x õ +_GD.g ä D gñ Electro-Chemical Gas Analyzer(Digitron, GreenLine MK II)s jgñ +_GŒ. ³ öm ä DÑ Š @ ê ½É í0o gñ õ ê ~ D ½gÑ ÊÁS 1 õ jgñ fmgœ. Y o 5 FÑŠ }Gñ k, NO Ú SO 2 fmq à_ s <4ÝD.gŠ,gÆQk³ ÍMFo 50 kv, : ) c² 2 200 Hz, ÍQÑo 7.2 sec, SO 2 ðd 2 800 ppm, NO ðd 2 100 ppms ÄGŒ. ³ öm =2 ä D³ Íæ2 MF, ä D =(Y1Q Ž«) ), ÍQ Ñ Ú àd ÆQ(D 5, ~ ) ÙÑ ÊKŒ[21]. á õgñš2 )T-Ë ³ öms «ÄK NO x, SO 2 fm Y s.g ÍMFs 20-50 kv³ dqzœ. ä D SO 2 2 800-1,500 ppmk³, NO 2 100-300 ppmk³, NH 3 2 100-3,200 ppmk³ dqzk ÍQÑo 2.94-7.2 sec³, : ) c² 2 50-200 Hz³ dqzœ. HÇ Y êëo 3 «Y } á +_K à èjõ ÄGŒ. 3. ûg Z +{ 3-1. (<? Ÿ {à SO 2 C» 3-1-1. ÍMF Fig. 2ÑŠ ä D³ Íæ2 MF«SO 2 fmñ Âj2 s ðd SO 2 õ dqÿš +_GŒ. ä D³ Íæ2 : ) c² Q Í QÑo,g ÆQk³ GÊ, ä D³ Íæ2 MFs 20-50 kv³ dqzk, ä D³ àæ2 ðd SO 2 Í 800, 1,200, 1,500 ppm³ A ÎÎÑŠ SO 2 fm ÁSs + Fig. 1. Schematic of experimental set up. Ÿ @ C43 C1ƒ 2005 2 Fig. 2. SO 2 removal efficiencies for various initial SO 2 concentrations as a function of applied voltage (pulse frequency=200 Hz, residence time=7.2 s).
I# ñ K à_ñ K z Ú 0 131 _GŒ. ä D³ Íæ2 MF«ÍO MÉË«Í(2 èñw(í ÍGñ SO 2 fm ä Ñ y K l Ë(O, O 3, OH, OH 2 ) @ 2 ÍG ³ Ëê uñ dhä Ñ K SO 2 fmáso ÍGÊ ÀŒ. ÍMF«50 kv«ê ðd SO 2 Í 1,500 ppm ³ A2 SO 2 fmás«10%«é a«800 ppm³ A2 SO 2 fmás«29%³ ÍGŒ. «2 ðd SO 2 Í s ä D ÑŠ SO 2 fmñ gæ2 Ñ w(í Jk³ Q«1 Gj æ SO 2 fmás«ýg 2 ak³ ~ êœ. 3-1-2. ÍQÑ Fig. 3o ä D³ K½æ2 D Í QÑ(D K) d Í SO 2 fmñ Âj2 s Œ. ä D³ Íæ2 MF ê :) c² 2,g ÆQk³ GÊ, ÍQÑo 2.94, 5.43, 7.2 sec³ dqzs A ðd SO 2 dñ! SO 2 fm ÁS s ÎÎ +_GŒ. Í QÑ«ÍWÑ! ä D Ñ ê öm òñ SO 2 Í Ëå2 QÑ«L (Ê 1Ú QÑ Ÿ8 dhä Ñ g SO 2 Í Mhæ ³ SO 2 fmás«í GÊ ÀŒ. Fig. 2ÑŠsF ðd SO 2 Í ÍO SO 2 f Mõ.K ~É èñw( Šo ÝG ³ SO 2 fmás «ÝGÊ ÀŒ. 3-1-3. :) c² Fig. 4Ñ2 ä D³ Íæ2 MF :) c² dí SO 2 fmñ Âj2 s,œ. ä D³ Íæ2 MFê SO 2 ð D 2,g ÆQk³ GÊ, :) c² õ dqzs A ÍQÑ dñ!ñ SO 2 fm U s <4ÝIŒ. ÍMF : ) c² Í ÍWÑ!.QÑ MÉÑ Íg(2 èñ Fig. 4. SO 2 removal efficiencies for various residence times as a function of pulse frequency ([SO 2 ] 0 =800 ppm, applied voltage=50 kv). w(2 ÍGñ Qo Š l Ë«@ æê l Ëê uñ dhä Ñ g Qo Š SO 2 Í fmæ ³ SO 2 fmás«ígê ÀŒ. Í QÑ«ÍWÑ H QÑ Ÿ8 dhä Ñ g fmæ2 SO 2 Šo ÍK as Ý«Ê ÀŒ. 3-1-4. Í) Æ Fig. 52 D Æ dí SO 2 fmñ Âj2 s Œ. ä D³ Íæ2 MF, :) c², ðd SO 2 2,g ÆQ k³ GÊ, H 2 OQ O 2 ƒíñ!ñ SO 2 fmáss ÆGŒ. D Í QÑ«7.2 sec ³ A, SO 2 Q N 2 D Os àgñ ³ ömgs A2 SO 2 fmás«10%«(o SO 2 +N 2 +O 2 ÑŠ 2 SO 2 fmás«14%³, -Ê SO 2 +N 2 +O 2 +H 2 OÑŠ2 SO 2 f MÁS«29%³ ÍGŒ. «2 ~ê Í ƒíöñ! NO Ú SO 2 H ä Ñ îñg2 d (O, O 3, OH, OH 2 ) Ë @ «ÍGñ dhä Ñ K SO 2 H Í ÍG ³ SO 2 fmás«ígd Aé«Œ. ä D ³ SO 2 +N 2 O s Ä s Î, SO 2 ÊÑw( MÉËê )[J GM (R 1) Œñ ~ÉË(N * 2, O)ê ä (R 2,3)Ñ g SO SO 3 ³ M hæ ³ SO 2 fm ÁS«10% ÍK as Ý«Ê ÀŒ[16, 22]. Fig. 3. SO 2 removal efficiencies for various initial SO 2 concentrations as a function of residence time (pulse frequency=200 Hz, applied voltage=50 kv). e+so 2 SO+O+e (1) N * 2 +SO 2 N 2 +SO+O (2) SO 2 +O SO 3 (3) 3-2. (<?Ÿ {à NO SO 2 C» 3-2-1. ðd Korean Chem. Eng. Res., Vol. 43, No. 1, February, 2005
132 6 Æö6Ÿ?ö6/Ž ÆQk³ GÊ, NO ðd õ 100, 200, 300 ppmk³, SO 2 ðd õ 0, 800, 1,200, 1,500 ppmk³ ÎÎ dqzœ. á õgñš ÄK à_ ÑŠ +_ê NO 2 2 ðd NO Ñ 1% _ ³ Œ. «2 NO³z NO 2 Í @ æéké OH OH 2 Ëê uñ ä Ñ g z~ NO 2 «HNO 3 ³ dê ak³ êœ.! Š á õgñš2 NO dos à_ dñ!,œ. ðd NO Í 100 ppm Î, NO Š fmqñ2 fmás«68%³ +_æé k SO 2 õ 800 ppm «ƒí s AÑ2 fmás«89%³ u 21% ÍŒ. SO 2 ƒíñ!ñ NO fm ÁS ÍÑ K _ek èno 4) äê àí ÇŒ. K ÍD k³ á õ gñšsf H 2 OQ ê O 2 (10%)õ SO 2, NOQ Wÿ ³ öm ä DÑ àk Î, Œ{ê ço ä Ñ g NO fm ÁS«ÍO Àk ÝŒ áj fm èn ä«gêœ[7]. 2NO+O 2 2NO 2 NO 2 +SO 2 +H 2 O H 2 SO 4 +NO Fig. 5. SO 2 removal efficiencies for various gas compositions as a function of residence time ([SO 2 ] 0 =800 ppm, applied voltage=50 kv). SO 2 ðd Í 1,200, 1,500 ppm³ A NO fmáso NO Š fmqýœ2 ÍG(O ðd SO 2 ÍÑ!ñ NO f MÁSo Æ ÝG2 as Ý«Ê ÀŒ. «2 ðd SO 2 Í ÍO NO fmo 4n SO 2 fmõ.k dhä Ñ Qo «ÄÞD Aé«êJk³ NO fmõ. K Mt Ñw( Š«ÝK a«œ. ðd NO Í ÍWÑ! NO fmõ.k ~É èñw( Šo ÝGñ NO f MÁS«ÝGÊ ÀŒ. Fig. 6. NO removal efficiencies for various initial NO concentrations as a function of initial SO 2 concentration (applied voltage=50 kv, residence time=7.2 s). Fig. 6o NOQ SO 2 õ ŸQÑ àgs A SO 2 ðd dq NO ðd dí NO fmñ Âj2 s ÝñcÊ À Œ. ä D³ Íæ2 MF, :) c², D ÍQÑo,g Ÿ @ C43 C1ƒ 2005 2 Fig. 7. SO 2 removal efficiencies for various initial NO concentrations as a function of initial SO 2 concentration (applied voltage= 50 kv, residence time=7.2 s).
I# ñ K à_ñ K z Ú 0 133 Fig. 8. NO removal efficiencies for various initial NO concentrations as a function of applied voltage ([SO 2 ] 0 =800 ppm, pulse frequency =200 Hz, residence time=7.2 s). Fig. 9. NO removal efficiencies for various initial NO concentrations as a function of applied voltage ([SO 2 ] 0 =800 ppm, pulse frequency =200 Hz, residence time=7.2 s). Fig. 7o Fig. 6ê ço à_æqñš NOQ SO 2 õ ŸQÑ à Gs A NOQ SO 2 ðd dí SO 2 fmñ Âj2 s Œ. ðd SO 2 Í 1,200, 1,500 ppm ³ A2 ðd NO Í 0-300 ppmb( g SO 2 fmásñ à s Ùj( :(O ðd SO 2 Í 800 ppmk³ WGJ I ³ A2 SO 2 fmás«wgj j Ê ÀŒ. ðd NO Š«100 ppmz ÍWÑ! Fig. 6ÑŠQ ço «K³ SO 2 fmõ.k. ~É Ñw( Šo ÝG ³ SO 2 fmás«ýgê ÀŒ. ðd SO 2 Í ÍWÑ! SO 2 fmõ.g Qo Š M tñw(í gös Ý«Ê ÀŒ. 3-2-2. ÍQÑ Fig. 8Ñ2 ä D³ K½æ2 D ÍQÑ«NOQ SO 2 ŸQ fmñ Âj2 s,œ. ä D³ Íæ2 MF, : )c², SO 2 ðd 2,g ÆQk³ GÊ, NO ðd õ 100, 200, 300 ppmk³, ä D³ K½æ2 D ÍQÑs 2.94-7.2 sec³ dqzœ. Fig. 6ê 7ÑŠsF NOOs Š fm s AÝŒ NOQ SO 2 õ ŸQ fm s A NO fmás«ígê À Œ. D ÍQÑ«ÍO ä D ÑŠ H QÑ Ÿ8 NO Hä Ñ g NO fmás«ígê ÀŒ. ðd NO Í ÝWÑ! NO fmõ.k ~É èñw( Šo ÍG NO fmás«ík as Ý«Ê ÀŒ. 3-2-3. ÍMF Fig. 92 ä D³ Íæ2 MF«NOQ SO 2 ŸQ fmñ Âj2 s Œ. ä D³ Íæ2 :) c², D Í QÑ, SO 2 ðd 2,g ÆQk³ GÊ, ä D³ Í æ2 MFo 20-50 kv³, ðd NO 2 100, 200, 300 ppmk Fig. 10. NO removal efficiencies for various initial NO concentrations as a function of pulse frequency ([SO 2 ] 0 =800 ppm, applied Voltage=50 kv, residence time=7.2 s). ³ dqzœ. Fig. 8ÑŠsF NOOs Š fm s AÝŒ NOQ SO 2 õ ŸQ fm s A NO fmás«j Ê ÀŒ. ä D³ Íæ2 MF«ÍWÑ! ä D à Korean Chem. Eng. Res., Vol. 43, No. 1, February, 2005
134 6 Æö6Ÿ?ö6/Ž Fig. 11. NO removal efficiencies for various initial NH 3 concentrations as a function of applied voltage (pulse frequency=200 Hz, residence time=7.2 s, [SO 2 ] 0 =800 ppm, [NO] 0 =100 ppm). æ2 Ñw(Í ÍGñ l Ë @ 2 ÍG Ê NO fmõ.k dhä o } ( ³ NO fmás«í GÊ ÀŒ. 3-2-4. :) c² Fig. 10ÑŠ2 ä D³ Íæ2 :) c² dí NO Ú SO 2 ŸQ fmñ Âj2 s ÝñgŒ. ä D³ Íæ2 MF, D Í QÑ, SO 2 ðd 2,g ÆQk³ GÊ, ä D³ Íæ2 :) c² 2 50-200 Hz³, ðd NO 2 100, 200, 300 ppmk³ dqzœ. :) c² Í ÍWÑ!.QÑ àmt«ígñ MÉË«Í(2 èñw(í ÍG ³ NO fmás«ígê ÀŒ. 3-2-5. DHn4 Fig. 11ê 122 DHn4 ƒíñ!ñ NOQ SO 2 fmu s ÎÎ Œ. ä D³ Íæ2 :) c², D Í QÑ, SO 2 ðd, NO ðd 2,g ÆQk³ GÊ, ä D³ Íæ2 MFs 20-50 kv³, ä D³ àæ2 ðd NH 3 2 0-2,400 ppmk³ dqzœ. ÍMF«50 kv ³ A, Fig. 11ÑŠ ä D³ NH 3 Í àæ( :s A2 NO fmáso 89%«É a«nh 3 Í 2,400 ppmk³ àgs A2 NO fmás«99.8%³ ÍGÊ Fig. 12ÑŠ NH 3 õ àg( :s A2 SO 2 fmáso 25%«É2) NH 3 õ 2,400 ppmk³ àwñ! SO 2 fmáso 71%³ ÍGŒ. NH 3 õ ƒíwñ! NH 3 Í SO 2 Q uíj ä Gñ Œ DH((NH 4 ) 2 SO 4 Ù)s @ GÊ «Rj @ ê zdh,ñ NOÍ NH 3 Q Wÿ ô ä s ³kÿD AéÑ NO Ú SO 2 fmás«j ÍG2 ak³ ~ êœ. Ÿ @ C43 C1ƒ 2005 2 Fig. 12. SO 2 removal efficiencies for various initial NH 3 concentrations as a function of applied voltage (pulse frequency=200 Hz, residence time=7.2 s, [SO 2 ] 0 =800 ppm, [NO] 0 =100 ppm). 4. û «á õgñš2 :) ³ öm ä Dõ «ÄGñ à_ dí SO 2 fmq NO Ú SO 2 ŸQfMÑ Âj2 s Y J k³ ~ Gk, à_ s ~ GD.g ðd NO Ú SO 2, ÍMF, D ÍQÑ, :) c², D Æ, D Hn4 Ùs dqzœ. (1) ä DÑ Íæ2 MFê :) c² Í ÍO, ä D ³ K½æ2 D ÍQÑ«ÍO SO 2 fmáso Í Gk, ðd SO 2 Í ÝO ä D³ àê SO 2 fmáso ÍGŒ. (2) SO 2 +N 2 HYÍ)Ñ ~ê Í ƒíöñ! SO 2 f MÁSo ÍGŒ. (3) NO Ú SO 2 ŸQ fmq SO 2 ƒí2 NO fmñ à s cé(o NO ƒí2 SO 2 fmñ à s c( :IŒ. (4) NO Ú SO 2 ŸQ fmq D ÍQÑê ÍMF, :) c² Í Í O NO Ú SO 2 fmáso ÍGŒ. (5) NO Ú SO 2 ŸQ fmq ƒíæ2 NH 3 Í ÍO NO Ú SO 2 fmáso j ÍG2), U¾ NH 3 Í 2,400 ppm³ A NO2 M Œ fmæék SO 2 Íß o f MÁSs á Y p.ñš»éœ. á õgñš Y Jk³», ê2 à_ ÆQ dñ!ñ ªJ ÁS ~ ê Yf NO x Ú SO x fm à_ñ dgñ JÄWÑ À ÁSJ ÒM ÆQ Ú Mt Ýõ.K ßj íè Ñ y K _Ýõ fào Às ak³ D êœ.
[ «øéo 2002 KhH, é (òñ Gñ õgæ É5nŒ(KRF-2002-041-D00123). ƒ+s I# ñ K à_ñ K z Ú 0 135 1. Clements, J. S., Mizuno, A., Wright, C. F. and Davis, R. H., Combined Removal of SO 2, NO X, and Fly Ash Simulated Flue Gas using Pulsed Streamer Corona, IEEE Trans. Ind. Appl., 25(1), 63-69(1989). 2. Chang, J. S., Lawless, P. A. and Yamanoto, T., Corona Discharge Process, IEEE Trans. Ind. Appl., 19(6), 1152-1166(1991). 3. Marnix, A. T., van Hardeveld, R. and van Veldhuizen, E. M., Reactions of NO in a Positive Streamer Corona Plasma, Plasma Chem. Plasma Process., 17(4), 371-391(1997). 4. Masuda, S. and Hosokawa, S., Control of NO x by Positive and Negative Pulsed Corona Discharge, IEEE Trans. Ind. Appl., 29(4), 781-785(1993). 5. Nunez, C. M., Ramsey, G. H., Ponder, W. H., Abbott, James, H., and Hamel, L., An Innvolative Control Technology for VOCs and Air Toxics, AIR & WASTE, 43(2), 242-247(1993). 6. Tas, M. A., van Hardeveld, R. and van Veldhuisen, E. M., Reactions of NO in a Positive Steamer Corona Plasma, Plasma Chem. Plasma Process., 17(4), 371-391(1997). 7. van Veldhuisen, E. M., Zhou, L. M. and Rutgers, W. R., Combined Effects of Pulsed Discharge Removal of NO, SO 2 and NH 3 from Flue Gas, Plasma Chem. Plasma Process., 18(1), 91-111 (1998). 8. Yan, W., Wang, N., Zhu, Y. and Zhang, Y., SO 2 Removal from Industrial Flue Gases using Pulsed Corona Discharge, J. Electrostatics, 44(1), 11-16(1998). 9. Oda, T., Yamashita, R., Takahashi, T. and Masuda, S., Atmospheric Pressure Discharge Plasma Decomposition for Gaseous Air Contaminants-Trichlorotrifluoroethane and Trichloroethylene, IEEE Trans. Ind. Appl., 32(2), 227-232(1996). 10. Urashima, K., Chang, J. S. and Ito, T., Reduction of NO x from Combustion Flue Gases by Superimposed Barrier Discharge Plasma Reactors, IEEE Trans. Ind. Appl., 33(4), 879-886(1997). 11. Mok, Y. S. and Nam, I. S., Modeling of Pulsed Corona Discharge Process for the Removal of Nitric Oxide and Sulfur Dioxide, Chem. Eng. J., 85(1), 87-97(2002). 12. Bromberg, L., Cohn, D. R., and Rabinovich, A., Plasmatron Fuel Converter-Catalyst Systems for After Treatment of Diesel Vehicle Emissions, International J. Vehicle Design, 25(4), 275-282(2001). 13. Nishikawa, K. and Nojima, H., Air Purification Effect of Positively and Negatively Charged Ions Generated by Discharge Plasma at Atmospheric Pressure, Jpn. J. Appl. Phys., 40(8), 835-837(2001). 14. Amirov, R. H., Chae, J. O., Dessiaterik, Y. N., Filimonova, E. A. and Zhelezniak, M. B., Removal of NO x and SO 2 from Air Excited Streamer Corona: Experimental Results and Modeling, Jpn. J. Appl. Phys.,, 37(6), 3521-3529(1998). 15. Park, J. Y., Kim, I. K., Koh, H. S., Kim, J. D., Lee, D. C. and Chang, J. S., SO 2 Effect on NO x Removal by Corona Discharge System, Trans. KIEE., 47(11), 1979-1982(1998). 16. Kim, Y. H. and Hong, S. H., NO x /SO x Decomposition of Flue Gases by AC Dielectric Barrier Corona Discharges, Ungyong Mulli, 11(4), 393-400(1998). 17. Dinelli, G. L. and Civitano, M., Industrial Experiments on Pulsed Corona Simultaneous Removal of NO x and SO 2 from Flue Gas, IEEE Trans. Ind. Appl., 26(4), 535-541(1990). 18. Kim, D. J., Choi, Y. R. and Kim, K. S., Effects of Process Variables on NO x Conversion by Pulsed Corona Discharge Process, Plasma Chem. Plasma Process., 21(4), 625-650(2001). 19. Kim, D. J. and Kim, K. S., Analysis on Plasma Chemistry and Particle Growth in Corona Discharge Process for NO x Removal Using Discrete-Sectional Method, IEEE Trans. Plasma Sci., 31(2), 227-235(2003). 20. Park, J. H, Kim, D. J. and Kim, K. S., Analysis on NO x Conversion and Particle Characteristics in NO x Removal by Corona Discharge Process, HWAHAK KONGHAK, 40(3), 351-356(2002). 21. Chang, J.-S., Pontiga, F., Atten, P. and Castellanos, A., Hysterisis Effect of Corona Discharge in a Narrow Coaxial Wire-Pipe Discharge Tube with Gas Flow, IEEE Trans. Ind. Appl., 32(6), 1250-1256(1996). 22. Chang, M. B., Balbach, J. H., Rood, M. J. and Kushner, M. J., Removal of SO 2 from Gas Streams Using a Dielectric Barrier Discharge and Combined Plasma Photolysis, J. Appl. Phys., 69(8), 4409-4417(1991). Korean Chem. Eng. Res., Vol. 43, No. 1, February, 2005